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Analysis of institutional authors

Decker, JAuthorDel Castillo González IAuthorRodriguez-Chueca, JCorresponding AuthorGiannakis, SCorresponding Author

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April 11, 2024
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Homogeneous vs. heterogeneous photo-Fenton elimination of antibiotic-resistant bacteria bearing intracellular or extracellular resistance: Do resistance mechanisms interfere with disinfection pathways?

Publicated to:Journal Of Environmental Chemical Engineering. 12 (2): 112147- - 2024-04-01 12(2), DOI: 10.1016/j.jece.2024.112147

Authors: Decker, J; Le, TTM; Entenza, JM; Gonzalez, ID; Lehmann, AH; Pulgarin, C; Rodriguez-Chueca, J; Giannakis, S

Affiliations

Ecole Polytech Fed Lausanne EPFL, Inst Chem Sci & Engn ISIC, Sch Basic Sci SB, Grp Adv Oxidat Proc GPAO, Stn 6 - Author
Univ Antioquia, Inst Chem, Fac Exact & Nat Sci, Environm Remediat & Biocatalysis Grp, Calle 70 52-21 - Author
Univ Lausanne UNIL, Fac Biol & Med, Dept Fundamental Microbiol, Biophore Bldg - Author
Univ Politecn Madrid UPM, Dept Ingn Civil Hidraul Energia & Medio Ambiente, Unidad docente Ingn Sanitaria, ETS Ingn Caminos Canales y Puertos, Prof Aranguren,s-n - Author
Univ Politecn Madrid UPM, Dept Ingn Quim Ind & Medio Ambiente, ETS Ingn Ind, Jose Gutierrez Abascal 2 - Author
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Abstract

The present study aimed to fill the knowledge gap between the implications of intracellular and extracellular antibiotic resistance mechanisms may inflict on the inactivation pathways of the photo-Fenton process under mild conditions. It was thus designed as a cross-comparison of the effect of homogeneous and heterogeneous photo-Fenton (near-neutral pH, [Fe]=1 mg/L, and [H2O2]=10 mg/L) on seven strains of Staphylococcus aureus exhibiting different mechanisms of antibiotic resistance, or susceptibility. Additionally, variations in antibiotic tolerance (MIC test) and relative changes in the presence of antibiotic resistance genes were qualitatively monitored during treatment using PCR. The results suggest that resistance to antibiotics does not confer enhanced resistance to photo-Fenton, as it attained a 4-logU reduction within 50-100 min for all strains, regardless of resistance status. Strains that express intracellular resistance mechanisms do not pose a risk; however, strains that express external mechanisms for their defense against antibiotics occasionally interfere with the inactivation process. This phenomenon was mainly linked to the cell wall thickening of some of the externally resistant strains as compared to their susceptible homologues. Eventually, by conferring resistance to antibiotics, this cell wall alteration may reduce susceptibility to Fenton-related reagents by either reducing their intracellular diffusion or rendering cell walls less prone to leaching upon extracellular attacks. In addition, the photo-Fenton process either remained unchanged or lowered the antibiotic resistance threshold. Moreover, the homogeneous photo-Fenton system considerably lowered the detection of antibiotic resistance genes within 90 min with respect to hv, hv/H2O2, or heterogeneous photo-Fenton. In conclusion, the results suggest that the homogeneous photo-Fenton system could be an effective treatment for hindering the spread of antibiotic resistance, but treatment conditions should aim to maximize the degradation of ARG, as their concentration decreases more slowly than that of bacteria.

Keywords

Antibiotic resistance genesAntibiotic toleranceAntibiotic tolerancesAntibioticsAntibiotics resistanceBacteriaBiodegradationCell wallsCell-wallDisinfectionExtracellularGenesHeterogeneous photo-fentonImage enhancementInactivationIronLightOxidationOxidation processesPhoto -fenton processPhoto-fenton processResistance mechanismsResistance to antibioticsSolar disinfectionStaphylococcus aureusTopoisomerase-ivUrban waste-waterVancomycin resistance

Quality index

Bibliometric impact. Analysis of the contribution and dissemination channel

The work has been published in the journal Journal Of Environmental Chemical Engineering due to its progression and the good impact it has achieved in recent years, according to the agency WoS (JCR), it has become a reference in its field. In the year of publication of the work, 2024 there are still no calculated indicators, but in 2023, it was in position 25/175, thus managing to position itself as a Q1 (Primer Cuartil), in the category Engineering, Chemical.

Independientemente del impacto esperado determinado por el canal de difusión, es importante destacar el impacto real observado de la propia aportación.

Según las diferentes agencias de indexación, el número de citas acumuladas por esta publicación hasta la fecha 2025-10-22:

  • WoS: 5
  • Scopus: 6

Impact and social visibility

From the perspective of influence or social adoption, and based on metrics associated with mentions and interactions provided by agencies specializing in calculating the so-called "Alternative or Social Metrics," we can highlight as of 2025-10-22:

  • The use of this contribution in bookmarks, code forks, additions to favorite lists for recurrent reading, as well as general views, indicates that someone is using the publication as a basis for their current work. This may be a notable indicator of future more formal and academic citations. This claim is supported by the result of the "Capture" indicator, which yields a total of: 29 (PlumX).

With a more dissemination-oriented intent and targeting more general audiences, we can observe other more global scores such as:

    It is essential to present evidence supporting full alignment with institutional principles and guidelines on Open Science and the Conservation and Dissemination of Intellectual Heritage. A clear example of this is:

    • The work has been submitted to a journal whose editorial policy allows open Open Access publication.
    • Assignment of a Handle/URN as an identifier within the deposit in the Institutional Repository: https://oa.upm.es/84108/

    As a result of the publication of the work in the institutional repository, statistical usage data has been obtained that reflects its impact. In terms of dissemination, we can state that, as of

    • Views: 158
    • Downloads: 64

    Leadership analysis of institutional authors

    This work has been carried out with international collaboration, specifically with researchers from: Colombia; Switzerland; United States of America.

    There is a significant leadership presence as some of the institution’s authors appear as the first or last signer, detailed as follows: First Author (DECKER, JEREMIE) and Last Author (GIANNAKIS, STEFANOS).

    the authors responsible for correspondence tasks have been RODRIGUEZ CHUECA, JORGE JESUS and GIANNAKIS, STEFANOS.